Description & Special Features

Box type Physical Vapor Deposition system, based on prismatic/cylindrical vacuum chambers have 2 thermal and 1 DC-RF sputter source. Multi-layered thin films of different materials can be prepared by NVTS systems. Combined System can be tailored to fit user desires in order to produce multilayered, nanosized metallic, oxide, carbide or nitride films, such as Si, Al, Ti, SiO, WO, BaF2, MgF2, TiO2, Si3N4, SiO2, TiN.

Note: Box type Physical Vapor Deposition system, based on prismatic/cylindrical vacuum chambers have 2 thermal and 1 DC-RF sputter source. Multi-layered thin films of different materials can be prepared by NVTS systems. Combined System can be tailored to fit user desires in order to produce multilayered, nanosized metallic, oxide, carbide or nitride films, such as Si, Al, Ti, SiO, WO, BaF2, MgF2, TiO2, Si3N4, SiO2, TiN.